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Transport of Sputtered Particles in Capacitive Sputter Sources

机译:电容溅射源中溅射粒子的传输

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摘要

The transport of sputtered aluminum inside a multi frequency capacitivelycoupled plasma chamber is simulated by means of a kinetic test multi-particleapproach. A novel consistent set of scattering parameters obtained for amodified variable hard sphere collision model is presented for both argon andaluminum. An angular dependent Thompson energy distribution is fitted toresults from Monte Carlo simulations and used for the kinetic simulation of thetransport of sputtered aluminum. For the proposed configuration the transportof sputtered particles is characterized under typical process conditions at agas pressure of p=0.5 Pa. It is found that -- due to the peculiar geometricconditions -- the transport can be understood in a one dimensional picture,governed by the interaction of the imposed and backscattered particle fluxes.It is shown that the precise geometric features play an important role only inproximity to the electrode edges, where the effect of backscattering from theoutside chamber volume becomes the governing mechanism.
机译:借助动力学测试多粒子方法模拟了溅射铝在多频电容耦合等离子体室内的传输。提出了针对氩和铝的改进可变硬球碰撞模型获得的一组新颖一致的散射参数。蒙特卡罗模拟的结果拟合了随角度变化的汤普森能量分布,并将其用于溅射铝传输的动力学模拟。对于所提出的配置,在典型的工艺条件下,气压为p = 0.5 Pa时,对溅射粒子的传输进行了表征。发现-由于特殊的几何条件-可以在一维图中理解该传输,由结果表明,精确的几何特征仅在不靠近电极边缘的情况下发挥重要作用,其中电极从外部腔室体积的反向散射的影响成为控制机制。

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